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Chemical-Mechanical Polishing 2000 – Fundamentals and Materials Issues: Volume 613
Engelsk
Bogcover for Chemical-Mechanical Polishing 2000 – Fundamentals and Materials Issues: Volume 613 af , 9781107413146
Specifikationer
Sprog:
Engelsk
Sider:
176
ISBN-13:
9781107413146
Indbinding:
Paperback
ISBN-10:
1107413141
Kategori:
Udg. Dato:
5 jun 2014
Størrelse i cm:
22,9 x 15,2 x 1,0
Oplagsdato:
5 jun 2014

Chemical-Mechanical Polishing 2000 – Fundamentals and Materials Issues: Volume 613

Engelsk
Paperback 2014
Format:

Bog beskrivelse
Chemical-mechanical polishing (CMP) is a critical technology in the planarization of multilevel metallization systems and shallow-trench isolation in semiconductor manufacturing. This book, first published in 2001, provides an insight into the fundamental processes in CMP. Presentations from academia, government institutions and industry are featured.
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314,60 kr
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294 kr
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Specifikationer
Sprog:
Engelsk
Sider:
176
ISBN-13:
9781107413146
Indbinding:
Paperback
ISBN-10:
1107413141
Kategori:
Udg. Dato:
5 jun 2014
Størrelse i cm:
22,9 x 15,2 x 1,0
Oplagsdato:
5 jun 2014
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