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Chemical Vapour Deposition

- Growth processes on an atomic level
Af: Professor Karin Larsson Engelsk Hardback

Chemical Vapour Deposition

- Growth processes on an atomic level
Af: Professor Karin Larsson Engelsk Hardback
Tjek vores konkurrenters priser

Chemical vapour deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance, solid materials. This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT) calculations. By demonstrating the methodology behind the modelling and simulation of CVD growth processes, the text provides guidance and practical advice on how to acquire successful theoretical results. Worked examples, case studies, end-of-chapter summaries and animations of atomic-level surface processes are included to aid learning. After reading this text, researchers and students will have the knowledge they need to tailor-make desired growth processes for the deposition of materials with specific properties.


Key Features:


  • Covers CVD growth processes at the atomic level using a combination of theoretical and experimental tools


  • Provides the knowledge required to tailor-make desired growth processes for the deposition of materials with specific materials properties


  • Covers the main principles of CVD and the growth processes of the most common types of materials


  • Enables the reader to design new experimental setups, develop new materials with specific properties, interpret experimental results, and develop theoretical tools


  • Includes worked examples, case studies, end-of-chapter summaries and animations of atomic-level surface processes


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Tjek vores konkurrenters priser
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Chemical vapour deposition (CVD) is a vacuum deposition method used to produce high-quality, high-performance, solid materials. This is the first book to cover CVD growth processes at the atomic level using a combination of theoretical and experimental tools, including density functional theory (DFT) calculations. By demonstrating the methodology behind the modelling and simulation of CVD growth processes, the text provides guidance and practical advice on how to acquire successful theoretical results. Worked examples, case studies, end-of-chapter summaries and animations of atomic-level surface processes are included to aid learning. After reading this text, researchers and students will have the knowledge they need to tailor-make desired growth processes for the deposition of materials with specific properties.


Key Features:


  • Covers CVD growth processes at the atomic level using a combination of theoretical and experimental tools


  • Provides the knowledge required to tailor-make desired growth processes for the deposition of materials with specific materials properties


  • Covers the main principles of CVD and the growth processes of the most common types of materials


  • Enables the reader to design new experimental setups, develop new materials with specific properties, interpret experimental results, and develop theoretical tools


  • Includes worked examples, case studies, end-of-chapter summaries and animations of atomic-level surface processes


Vis mere
Se mere i:
Produktdetaljer
Sprog: Engelsk
Sider: 416
ISBN-13: 9780750331050
Indbinding: Hardback
Udgave:
ISBN-10: 0750331054
Kategori: Faststofkemi
Udg. Dato: 8 dec 2022
Længde: 32mm
Bredde: 178mm
Højde: 254mm
Forlag: Institute of Physics Publishing
Oplagsdato: 8 dec 2022
Forfatter(e): Professor Karin Larsson
Forfatter(e) Professor Karin Larsson

Kategori Faststofkemi

ISBN-13 9780750331050

Sprog Engelsk

Indbinding Hardback

Sider 416

Udgave

Længde 32mm

Bredde 178mm

Højde 254mm

Udg. Dato 8 dec 2022

Oplagsdato 8 dec 2022

Forlag Institute of Physics Publishing

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