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  3. Kondenserede fasers fysik: væskeform og faststoffysik

Laser Heat-Mode Lithography

- Principle and Methods
Af: Jingsong Wei Engelsk Hardback

Laser Heat-Mode Lithography

- Principle and Methods
Af: Jingsong Wei Engelsk Hardback
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This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength. Laser heat-mode lithography techniques greatly simplify production procedures because they require neither a particular light source nor a particular environment; further, there are no pre-baking and post-baking steps required for organic photoresists. The pattern feature size can be either larger or smaller than the laser spot by adjusting the writing strategy. The lithographic feature size can also be arbitrarily tuned from nanoscale to micrometer without changing the laser spot size. Lastly, the line edge roughness can be controlled at a very low value because the etching process is a process of breaking bonds among atoms. The book offers an invaluable reference guide for all advanced undergraduates, graduate students, researchers and engineers working in the fields of nanofabrication, lithography techniques and systems, phase change materials, etc.

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This book provides a systematic description and analysis of laser heat-mode lithography, addressing the basic principles, lithography system, manipulation of feature size, grayscale lithography, resist thin films, and pattern transfer, while also presenting typical experimental results and applications. It introduces laser heat-mode lithography, where the resist thin films are essentially an opto-thermal response to the laser beam with changeable wavelength and are not sensitive to laser wavelength. Laser heat-mode lithography techniques greatly simplify production procedures because they require neither a particular light source nor a particular environment; further, there are no pre-baking and post-baking steps required for organic photoresists. The pattern feature size can be either larger or smaller than the laser spot by adjusting the writing strategy. The lithographic feature size can also be arbitrarily tuned from nanoscale to micrometer without changing the laser spot size. Lastly, the line edge roughness can be controlled at a very low value because the etching process is a process of breaking bonds among atoms. The book offers an invaluable reference guide for all advanced undergraduates, graduate students, researchers and engineers working in the fields of nanofabrication, lithography techniques and systems, phase change materials, etc.

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Se mere i:
Produktdetaljer
Sprog: Engelsk
Sider: 208
ISBN-13: 9789811509421
Indbinding: Hardback
Udgave:
ISBN-10: 9811509425
Kategori: Kondenserede fasers fysik: væskeform og faststoffysik
Udg. Dato: 29 nov 2019
Længde: 0mm
Bredde: 155mm
Højde: 235mm
Forlag: Springer Verlag, Singapore
Oplagsdato: 29 nov 2019
Forfatter(e): Jingsong Wei
Forfatter(e) Jingsong Wei

Kategori Kondenserede fasers fysik: væskeform og faststoffysik

ISBN-13 9789811509421

Sprog Engelsk

Indbinding Hardback

Sider 208

Udgave

Længde 0mm

Bredde 155mm

Højde 235mm

Udg. Dato 29 nov 2019

Oplagsdato 29 nov 2019

Forlag Springer Verlag, Singapore

Kategori sammenhænge