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Simulation of Deposition Processes with PECVD Apparatus
Engelsk Hardback
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Simulation of Deposition Processes with PECVD Apparatus

Engelsk Hardback

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Om denne bog
This book discusses the study of simulating the growth of a thin film by chemical vapour deposition (CVD) processes. In recent years, due to the research in producing high-temperature films by depositing low pressures, the processes have increased and understanding the control mechanism of such processes has become very important. An underlying hierarchy of models for low-temperature and low-pressure plasma is presented in order to discuss the processes that can be used to implant or deposit thin layers of important materials. Due to the multi-scale problem of the flow and reaction processes, the authors propose multi-scale problems which are divided into near-field and far-field models.
Product detaljer
Sprog:
Engelsk
Sider:
144
ISBN-13:
9781621003656
Indbinding:
Hardback
Udgave:
ISBN-10:
1621003655
Kategori:
Udg. Dato:
1 jan 2012
Længde:
14mm
Bredde:
162mm
Højde:
234mm
Forlag:
Nova Science Publishers Inc
Oplagsdato:
1 jan 2012
Forfatter(e):
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